The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2004
Filed:
Sep. 06, 2002
Jeong-hyuck Park, Kyungki-do, KR;
Hee-duk Kim, Kyungki-do, KR;
Jung-hun Cho, Kyungki-do, KR;
Jong-wook Choi, Kyungki-do, KR;
Sung-bum Cho, Kyungki-do, KR;
Young-koo Lee, Kyungki-do, KR;
Jin-sung Kim, Kyungki-do, KR;
Jang-eun Lee, Kyungki-do, KR;
Ju-hyuck Chung, Kyungki-do, KR;
Sun-hoo Park, Kyungki-do, KR;
Jae-hyun Lee, Yongin, KR;
Shin-woo Nam, Kyungki-do, KR;
Samsung Electronics Co., Ltd., Kyungki-do, KR;
Abstract
A process chamber used in the manufacture of a semiconductor device for etching a material layer on a semiconductor wafer includes an electrostatic chuck for holding the semiconductor wafer, and an annular edge ring which surrounds the side of the semiconductor wafer on the electrostatic chuck to prevent the semiconductor wafer from departing from its original position. The annular edge ring has a first side which faces the side of the semiconductor wafer and contacts firmly with the side of the semiconductor wafer.