The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Mar. 07, 2003
Masashi Tanaka, Yokohama, JP;
Masato Kumazawa, Kawasaki, JP;
Kinya Kato, Yokohama, JP;
Masaki Kato, Yokohama, JP;
Hiroshi Chiba, Yokohama, JP;
Hiroshi Shirasu, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.