The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Sep. 28, 2001
Applicant:
Inventors:
Tokuhiko Tamaki, Osaka, JP;
Koichi Kawashima, Kyoto, JP;
Yasuo Sakurai, Kyoto, JP;
Kenji Tateiwa, Osaka, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/906 ; H01L 3/10352 ;
U.S. Cl.
CPC ...
H01L 2/906 ; H01L 3/10352 ;
Abstract
Variations in the size of a linear pattern resulting from difference in mask pattern layout are prevented by setting the perimeter of the linear pattern per unit area in a specified range irrespective of the type of a semiconductor integrated circuit device or by adjusting a process condition in accordance with type-to-type difference in the perimeter of the linear pattern per unit area.