The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Jul. 25, 2003
Houjin Huang, Kanagawa, JP;
Hisashi Kajiura, Kanagawa, JP;
Mitsuaki Miyakoshi, Kanagawa, JP;
Atsuo Yamada, Kanagawa, JP;
Masashi Shiraishi, Tokyo, JP;
Sony Corporation, Tokyo, JP;
Abstract
An arc electrode structure, for producing carbon nanostructures, which includes a first electrode and two or more second electrodes disposed within a chamber is provided. The electrodes are connected to a voltage potential to produce an arc-plasma region. The first electrode has a sloped surface with a plurality of holes therein for holding catalyst. The first electrode's sloped surface, and the positioning of the plurality of second electrodes allows control of the direction and region of arc-plasma. Further, the first electrode has a central bore which may be either a blind bore, or a through bore. The blind bore collects unwanted deposits that slide off of the sloped surface of the first electrode. The throughbore either allows soot and carbon nanostructures to be removed from the chamber, or allows organic vapor to be introduced into the chamber. When the throughbore is used to introduce organic vapor into the chamber, the vapor is directed through the arc-plasma region so that carbon nanostructures are built up by a CVD process rather than being broken off of carbon electrodes.