The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2004

Filed:

Jan. 11, 2002
Applicant:
Inventors:

Kyo Ichikawa, Tsurugashima, JP;

Kouichi Takagi, Kawagoe, JP;

Nobuyuki Suzuki, Sakado, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01C 1/00 ; H01L 2/102 ; C08F 2/46 ; G03F 7/04 ;
U.S. Cl.
CPC ...
H01C 1/00 ; H01L 2/102 ; C08F 2/46 ; G03F 7/04 ;
Abstract

An alkali development type photocurable composition comprises (A) an alkali-soluble macromolecular binder having a weight-average molecular weight in the range of 5,000 to 100,000 and an acid value in the range of 50 to 150 mg KOH/g and obtained by causing (d) a compound possessing one glycidyl group in its molecule to react with a carboxyl group of (A-1) a copolymer of (a) an ethylenically unsaturated bond-containing compound possessing one carboxyl group in its molecule with (b) an ethylenically unsaturated bond-containing compound possessing neither hydroxyl group nor acidic group in its molecule, or a carboxyl group of (A-2) a copolymer of the compounds (a) and (b) mentioned above and (c) an ethylenically unsaturated bond-containing compound possessing a hydroxyl group and then causing (e) a polybasic acid anhydride to react with a hydroxyl group caused by the above reaction, (B) an inorganic powder, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) an organic solvent. By using this composition, such calcined patterns as a conductor pattern and a dielectric pattern of high fineness may be formed by the photolithographic technique.


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