The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Sep. 27, 2002
Applicant:
Inventors:
Michael F. Mattes, Chandler, AZ (US);
Ralph B. Danzl, Tempe, AZ (US);
Assignee:
Medtronic, Inc., Minneapolis, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 ;
U.S. Cl.
CPC ...
B81C 1/00 ;
Abstract
A method for forming a microstructure from a substrate is provided. The method includes providing a monocrystalline substrate having a (100) orientation and subjecting a first portion of the substrate to ion bombardment to effect ion implantation to a desired penetration depth. A second portion of the substrate is etched to a depth at least as great as the desired penetration depth. The substrate then is thermally treated to form a microstructure at a surface of the substrate and to effect at least partial separation between the microstructure and the substrate.