The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Feb. 04, 2002
Hideyuki Kazumi, Hitachinaka, JP;
Manabu Edamura, Niihari-gun, JP;
Kazuyuki Ikenaga, Niihari-gun, JP;
Atsushi Ootake, Hitachi, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma-assisted processing apparatus has a vacuum vessel defining a processing chamber, a gas supply line for carrying gases into the processing chamber, a workpiece support disposed in the processing chamber and serving as an electrode, a disk antenna for radiating a high-frequency wave having a frequency in the VHF or the UHF band into the processing chamber, a high-frequency waveguide for guiding a high-frequency wave to the disk antenna, and a window made of a dielectric material isolating the disk antenna from the processing chamber. A conductive ring is disposed between the disk antenna and the window such that one surface thereof is in contact with a peripheral part of the disk antenna.