The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2004
Filed:
Aug. 29, 2001
Joseph DelPico, Brockton, MA (US);
Yves G. Conturie, Needham, MA (US);
Other;
Abstract
A system is provided in which an expanded non-collimated source of light may be used to produce a uniform polarized light exposure for use, for example, in the photo alignment of optical films. Uniformity of polarization and intensity may be maintained even when a high-intensity source of ultraviolet light is used. The system may be scaled in size to produce large exposures without sacrificing uniformity of intensity of uniformity of direction of polarization. The system includes a light source, a pile-of-plates polarizer, and a surface (such as the surface of an optical film) to be exposed. The pile-of-plates polarizer is oriented orthogonally to the surface, thereby providing a polarized light exposure having a uniform direction of polarization on the exposed surface. The light source may be oriented at Brewster's angle to the polarizer to improve polarization contrast.