The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2004

Filed:

Dec. 06, 2002
Applicant:
Inventors:

Ramesh Jagannathan, Rochester, NY (US);

Suresh Sunderrajan, Rochester, NY (US);

Seshadri Jagannathan, Pittsford, NY (US);

Glen C. Irvin, Jr., Rochester, NY (US);

Sridhar Sadasivan, Rochester, NY (US);

David J. Nelson, Rochester, NY (US);

Rajesh V. Mehta, Rochester, NY (US);

John E. Rueping, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/04 ; B05D 1/32 ;
U.S. Cl.
CPC ...
B05D 1/04 ; B05D 1/32 ;
Abstract

A method produces patterned deposition on a substrate ( ) from compressed fluid. A delivery system ( ) cooperates with a controlled environment ( ) retaining a substrate ( ) for receiving precipitated functional material along a fluid delivery path ( ) from the delivery system ( ). A mask ( ) is arranged in close proximity to the substrate ( ) for forming the patterned deposition on the substrate ( ).


Find Patent Forward Citations

Loading…