The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2004
Filed:
Mar. 12, 2003
Taira Takase, Nirasaki, JP;
Nobuyuki Nagayama, Nirasaki, JP;
Kouji Mitsuhashi, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Tokyo Electric Limited, Tokyo, JP;
Abstract
There is provided a method of cleaning completely a deposit on the surface of the member to be cleaned, of a plasma processing apparatus without any damage of the coating which has been formed anodized coating or sprayed coating on the surface of the member to cleaned. The method of cleaning comprises a chemical cleaning step of dipping in an organic solvent (e.g. acetone) (a); and then a step blowing pressurized air so as to remove the deposit which has been peeled from a buffer plate ( ) treated chemically (b); and then, of removing physically the deposit remained at the edges of the buffer plate ( ) by blasting by using a CO blast apparatus ( ), and f steps of dipping the buffer plate ( ) in pure water ( ), and imparting supersonic vibration to remove the deposit remaining on a buffer plate ( ).