The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
May. 22, 2001
Bernd Kleemann, Aalen, DE;
Klaus Heidemann, Oberkochen, DE;
Carl-Zeiss-Stiftung, , DE;
Abstract
A Littrow grating ( ) comprises a multiplicity of parallel diffraction structures ( ) succeeding one another periodically. The latter are arranged on a support ( ) defining a base area ( ). A diffraction structure ( ) comprises a blaze flank ( ) inclined towards the base area ( ) substantially at the Littrow angle (&dgr;). In addition the diffraction structure ( ) comprises a counter-flank ( ) which forms with the blaze flank ( ) at the apex of a diffraction structure ( ) an apex angle (&agr;) which is less than 90°. The counter-flank ( ) comprises at least two substantially plane area sections ( ). The latter extend, bordering one another and inclined relative to one another through an angle of inclination (&bgr;), parallel with the extension direction of the diffraction structure ( ). Due to the inclination of the at least two area sections ( ) relative to one another, the counter-flank ( ) exhibits all in all a concave surface viewed from the light incidence side. A Littrow grating ( ) of high reflectivity is obtained, which may be achieved with the removal of only a small amount of material at the manufacturing stage.