The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Jan. 14, 2002
Boris Goldberg, Ashod, IL;
Silviu Reinhorn, Mevaseret-Zion, IL;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A polygon scanning system and method is provided wherein two or more light beams impinge at different incident angles on a polygon facet and are sequentially used for scanning the surface of a substrate as the polygon is rotated. Embodiments include a system comprising a polygon having a reflective facet, a rotation mechanism for rotating the polygon, and a light source for directing a plurality of light beams to impinge on the facet such that each light beam impinges on the facet at a different incident angle. Each light beam is reflected by the facet to scan a particular portion of a surface of a substrate during a respective time interval when the rotation mechanism is rotating the polygon. Each of the plurality of light beams is reflected onto the substrate surface using a respective portion of the facet surface, such that the sum of the respective portions of the facet surface used to reflect the light beams is a very large percentage of the total surface area. Thus, the system has a duty cycle of close to 100 percent as well as a high data rate.