The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Sep. 09, 1998
Joan Manel Garcia, Barcelona, ES;
Josep Maria Serra, Barcelona, ES;
William J. Allen, Barcelona, ES;
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
A shingle mask has width mismatched to maximum-eye-sensitivity spatial frequency at reading distance or closer, so the mask is tiled with minimal patterning. A second invention facet forms a grid of optimum width—it corresponds to maximum sensitivity only if seen from much farther than reading distance. A third facet forms a 2D mask with width 0.25 to 2 inches, better 0.375 to 1.5, ideally 0.5 to 1 (progressively further from maximum sensitivity; as further increases help little, this enables bandfree printing without very large masks). A fourth facet optimizes width in terms of distance in the image, for aesthetics, speed and economy. Another facet automatically forms a mask that time-varies nozzle-use modulation. Another prints nontext images by a multinozzle pen, modulating use; still others by plural pens each with a multinozzle array, refraining from use of certain nozzles e.g. to simulate dynamic pen staggering.