The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Oct. 18, 2002
Fujitsu Limited, Kawasaki, JP;
Abstract
A manufacturing method for a planar lightwave circuit device. A lift-off mask layer is formed on a planar lightwave circuit composed of cores and a cladding. The lift-off mask layer is next exposed to light by using a mask having a plurality of first patterns respectively corresponding to the cores and a plurality of second patterns each formed on at least one side of each first pattern in spaced relationship therewith. A wiring pattern material layer is next deposited on the lift-off mask layer exposed above, and the lift-off mask layer is next stripped off to thereby form a plurality of real patterns respectively corresponding to the first patterns and a plurality of dummy patterns respectively corresponding to the second patterns, from the wiring pattern material layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile