The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Nov. 21, 2002
Peter Lahnor, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A method and a semiconductor wafer configuration for producing an alignment mark for semiconductor wafers. In the method, an alignment mark region surrounded by a metal frame is formed on the semiconductor wafer. Subsequently, the alignment mark region and the metal frame are completely buried in at least one dielectric layer, in order to define an alignment mark area in the alignment mark region on the dielectric layer with a photolithography process. The boundary of the alignment mark area lies at a uniform distance within the boundary of the alignment mark region, defined by the metal frame. Subsequently (to uncover the alignment mark area by an anisotropic etching of the dielectric layer), the etching depth is defined in such a way that the alignment mark opening extends at least as far as the level of the metal frame.