The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Dec. 05, 2001
Applicant:
Inventors:
Keun Kyu Kong, Kyoungki-do, KR;
Gyu Dong Park, Kyoungki-do, KR;
Jae Chang Jung, Kyoungki-do, KR;
Ki Soo Shin, Seoul, KR;
Assignee:
Hynix Semiconductor Inc., Kyoungki-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; G03F 7/30 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/004 ; G03F 7/30 ; G03F 7/40 ;
Abstract
A pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator. When the formed pattern is heated, a thermal generator generates acid during the heating process, and a cross-linking reaction occurs to photoresist compositions, thereby preventing pattern width slimming due to SEM-beam for CD measurement.