The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Apr. 10, 2002
Chul-Hong Park, Yongin-si, KR;
Samsung Electronics Co., Ltd., Kyungki-do, KR;
Abstract
A transmittance adjustment mask includes a plurality of features and dummy features that correspond to circuit elements of integrated circuits, and uses an exposure device to optically transcribe a pattern corresponding to the integrated circuits onto a semiconductor substrate. The features have predetermined minimum dimensions and include an isolated edge and a plurality of dense edges. The dummy features are spaced apart and parallel from a corresponding isolated edge by a predetermined distance such that a light intensity in the dense edges and the isolated edges of the plurality of features are about the same. The dummy features adjust the amount of light radiated to peripheral areas of the isolated edges to match that radiated to peripheral areas of the dense edges, thereby reducing the difference of dimensions between densely packed features and isolated features transcribed onto the semiconductor substrate.