The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2004

Filed:

May. 31, 2002
Applicant:
Inventors:

Klaus Hartig, Avcoa, WI (US);

Johan Vanderstraeten, Drongen, BE;

Assignee:

N.V. Bekaert S.A., Zwevegem, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; C23C 4/08 ; B05D 1/02 ;
U.S. Cl.
CPC ...
C23C 1/434 ; C23C 4/08 ; B05D 1/02 ;
Abstract

A sputtering target may include: a) a backing adapted to be operatively connected to a sputter power source; and b) an outer layer of a sputterable material carried by the backing, the sputterable material including a mixture of zinc and a second metal having a melting point less than that of the zinc, the zinc and the second metal being present in the sputterable material in metallic form and arranged as discrete volumes of the second metal in a matrix of zinc so that the zinc and the second metal are present in the sputterable material in a substantially non-alloyed form.


Find Patent Forward Citations

Hartig, Klaus. (2004). Sputtering target and methods of making and using same (U.S. Patent No. 6787003). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6787003

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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