The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Sep. 25, 2002
Griffith E. Altmann, Webster, NY (US);
Bausch & Lomb Incorporated, Rochester, NY (US);
Abstract
An embodiment of the invention is directed to a method for determining an anterior or posterior surface parameter of an ophthalmic correcting surface (e.g., custom contact lens “CCL,” customized IOL, custom inlay, customized corneal surface) from a wavefront aberration measurement of an eye. A preferred embodiment relates to determining an anterior surface parameter of a dry, CCL designed to operate at 555 nm. An algorithm sets forth the method comprising misalignment correction, chromatic aberration correction, and power shift correction due to differences between aberration measurement wavelength and peak vision wavelength, and differences between aberration measurement location and aberration correction location. A device readable medium is the preferable vehicle for the algorithm.