The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Jan. 17, 2003
Shigeru Hayashi, Chofu, JP;
National Aerospace Laboratory of Japan, Tokyo, JP;
Abstract
This invention provides a liquid atomizing nozzle which utilizes a swirling flow of gas to form a liquid film in as uniform thickness as possible in a circumferential direction, and in which blockages are difficult to develop, and which can facilitate atomization by further reducing the size of the droplets which disperse from the front end. A liquid injected into an annular space through liquid passages formed in an outer cylinder in an incline to the radial direction, flows within the annular space having a component swirling in the circumferential direction. Air which flows into the annular space through air passages formed inclined in the same direction as the liquid passages in the outer cylinder develops a swirling flow Ac within the annular space acts upon the injected liquid to spread it onto an inner wall of the outer cylinder and further improving the uniformity of the thickness of the liquid film in a circumferential direction. When the liquid film disperses from the front end edge of the outer cylinder atomization is facilitated and the size of the droplets may be reduced further.