The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2004
Filed:
Nov. 14, 2001
Georg Ockenfuss, Santa Rosa, CA (US);
Robert E. Klinger, Rohnert Park, CA (US);
JDS Uniphase Corporation, San Jose, CA (US);
Abstract
A multilayer optical interference filter having a multiplicity of optical cavities separated by a dielectric reflector stacks to achieve either a very narrow passband region or sharp transition between the passband and reflective region is substantially free of stress to preserve the desired optical performance upon fabrication into miniature discrete filter elements. The substantial stress reduction is achieved by removing the filter from the substrate used in the deposition process in a controlled manner to preserve the structural integrity of the resulting free standing multilayer film structure. The structure can be further bonded or attached to other optical components to suppress a thermal shift in center wavelength without reintroducing stress or interposing a massive substrate in the optical path through the filter.