The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2004
Filed:
Dec. 03, 2002
Applicant:
Inventors:
Enio L. Carpi, Fishkill, NY (US);
Bernhard Liegl, Cold Spring, NY (US);
Assignee:
Infineon Technologies AG, , DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/176 ;
Abstract
A method for intra-cell alignment of a substrate and mask comprises providing a substrate comprising an exposed photosensitive material, providing a phase-shift mask, and aligning the phase-shift mask to an intra-cell structure on the substrate.
Quick Actions:
Carpi, Enio. (2004). Intra-cell mask alignment for improved overlay (U.S. Patent No. 6784070). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6784070
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