The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2004
Filed:
Jan. 15, 2003
Frank E. Livingston, Hermosa Beach, CA (US);
Henry Helvajian, Pasadena, CA (US);
The Aerospace Corporation, El Segundo, CA (US);
Abstract
The direct-write pulsed UV laser technique combined with the variable laser exposure fabrication method entails the precise variation of the laser irradiance during pattern formation in the photostructurable glass for variable laser exposing processing. The variable laser exposure patterning utilizes the dependence of the chemical etching rate on the controlled laser exposure dose for forming variable laser irradiated and crystallized regions of the exposed glass, that have variable etch rates that are dependent on the laser irradiance, resulting in the formation of high and low aspect ratio features in a common substrate that are realized during a single, maskless etch step.