The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2004
Filed:
Aug. 15, 2001
Alexander Joseph Babchin, Edmonton, CA;
Jian-Yang Yuan, Edmonton, CA;
Ezra Eddy Isaacs, Edmonton, CA;
Haibo Huang, Edmonton, CA;
Ross Sam Chow, Sherwood Park, CA;
Richard Anthony McFarlane, Edmonton, CA;
Dmytro Vassily Prudkyy, Edmonton, CA;
Alberta Research Council Inc., Edmonton, CA;
Abstract
This invention relates to the enhancement of chemical reactions by applying a high frequency electric field to a material. The frequency and amplitude of the electric field are selected in accordance with the properties of the reacting components in the bulk of chemical reactor. In general, the high frequency range is determined by the dielectric properties of reactant(s), that is, at any given temperature, when, for example, the specific conductivity starts to grow from its low frequency value. Typically, frequencies in the range of 100 kHz to 200 MHz or greater are suitable for the enhancement of the reactions. An electric field of any shape having Fourier components that when applied to a chemical process exhibits growth in the real part of conductivity relative to the low frequency value is of particular importance.