The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2004
Filed:
Apr. 18, 2002
Applicant:
Inventors:
Kazuo Hokkirigawa, Yonezawa, JP;
Motoharu Akiyama, Nagano-ken, JP;
Noriyuki Yoshimura, Nagano-ken, JP;
Assignee:
Minebea Co., Ltd., Nagano-ken, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24C 1/00 ;
U.S. Cl.
CPC ...
B24C 1/00 ;
Abstract
A polishing-washing method includes the steps of providing a polishing media containing a fine powder of an RB ceramic and/or CRB ceramic and bringing a medium stream containing the polishing media into contact with the surfaces of a body to be worked. In this method, the polishing media solution obtained after the polishing-washing can be re-used by recycling after simply separating the particles of metal oxides and the particles of removed burrs and cutting metal chips from the solution composition by utilizing a difference in specific gravity.