The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2004
Filed:
Nov. 06, 2001
Kuo-Pin Hsu, Kaohsiung Hsien, TW;
Au Optronics Corp., Hsinchu, TW;
Abstract
This invention provides a method for forming ribs in a plasma display panel (PDP). The PDP includes a glass substrate, and a plurality of address electrodes are formed on the glass substrate. A dielectric layer is formed above the address electrodes and the glass substrate. A plurality of sandblasting stoppers are formed on the dielectric layer, and the positions of these stoppers are corresponded to that of the address electrodes. The rib material layer is further formed to cover the dielectric layer and the sandblasting stoppers, and then a plurality of sand-resists are patterned on the rib material layer. By using the sand-resists as a mask, a sandblasting process is executed to form a plurality of ribs and expose the sandblasting stoppers. After removing the sand-resists and the sandblasting stoppers, the structures of the ribs are fixed by a sinter process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile