The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2004
Filed:
Nov. 07, 2001
Okimitsu Yasuda, Mie-ken, JP;
Seiichi Fujii, Yokohama, JP;
Suntec System Co., Ltd., Tokyo, JP;
Abstract
A sulfuric acid recycle apparatus capable of concentrating sulfuric acid, which is lowered in concentration upon completion of a wafer cleaning process, to a level to be recycled is provided. The sulfuric acid recycle apparatus for recycling sulfuric acid in a wafer cleaning fluid prepared by mixing sulfuric acid and hydrogen peroxide solution comprises a reaction bath having two openings formed of at least an introduction port and a discharge port for obtaining concentrated sulfuric acid by concentrating sulfuric acid in the wafer cleaning waste fluid introduced from the introduction port upon completion of a wafer cleaning process, then discharging the concentrated sulfuric acid from the discharge port, a wafer processing bath for processing wafers, and a supply unit for supplying the concentrated sulfuric acid to the wafer processing bath.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile