The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2004

Filed:

Sep. 29, 2000
Applicant:
Inventor:

Tetsuya Ishii, Hachioji, JP;

Assignee:

Olympus Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 ; G02B 2/744 ;
U.S. Cl.
CPC ...
G02B 5/18 ; G02B 2/744 ;
Abstract

A diffractive optical element including a stack of first, second and third optical regions or a stack of first, second, third and fourth optical regions, a first relief pattern formed between the first and second optical regions, and a second relief pattern formed between the second and third or between the third and fourth optical regions. The first and second relief patterns have substantially identical pitch distributions and are substantially aligned in a direction of an optical axis. Depths of the first and second relief patterns are set such that a wavelength dependency of diffraction efficiency can be decreased over a wavelength range to be used. It is possible to manufacture in a simple manner at a low cost a diffractive optical element in which undesired flares and ghosts are suppressed.


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