The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2004

Filed:

Jan. 15, 2003
Applicant:
Inventors:

Il-Joo Cho, Seoul, KR;

Kwang-Seok Yun, Seoul, KR;

Euisik Yoon, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/608 ;
U.S. Cl.
CPC ...
G02B 2/608 ;
Abstract

Disclosed is a micromirror actuator having a two-axis freedom and actuated by an electromagnetic force and fabrication method thereof. The micromirror actuator includes a substrate, a frame configured to be connected with the substrate, a micromirror configured to be connected with the frame, first and second torsion bars connecting the substrate with the frame, third and fourth torsion bars connecting the frame with the micromirror, four interdigitated cantilevers configured to be connected to the substrate, four connecting bars connecting the four interdigitated cantilevers with the frame, interconnection lines formed on the four interdigitated cantilevers and the micromirror, and first and second magnets installed outside the substrate. Since the micromirror actuator of the present invention can be actuated around two axes by electromagnetic force generated by electromagnetic field applied from outside, it is possible to obtain large force and large rotational angle. In addition, the micromirror actuator has a mechanically robust structure endurable against external impact, and is operable at a low voltage of 5V or loss. Further, it is possible to obtain a flat mirror surface sine the upper silicon layer of the SOI substrate is used as the mirror surface.


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