The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Apr. 11, 2001
Bantval Jayant Baliga, Raleigh, NC (US);
Silicon Semiconductor Corporation, Research Triangle Park, NC (US);
Abstract
A power field effect transistor utilizes a retrograded-doped transition region to enhance forward on-state and reverse breakdown voltage characteristics. Highly doped shielding regions may also be provided that extend adjacent the transition region and contribute to depletion of the transition region during both forward on-state conduction and reverse blocking modes of operation. In a vertical embodiment, the transition region has a peak first conductivity type dopant concentration at a first depth relative to a surface on which gate electrodes are formed. A product of the peak dopant concentration and a width of the transition region at the first depth is preferably in a range between 1×10 cm and 7×10 cm .