The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
May. 31, 2002
Applicant:
Inventors:
Tamotsu Murakami, Tokyo, JP;
Akiya Kamimura, Ibaraki, JP;
Assignee:
Toudai TLO, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 ;
U.S. Cl.
CPC ...
G03F 7/26 ;
Abstract
In an optical lithography using a mask pattern, or producing a large quantity of three-dimensional articles rapidly with high precision, a predetermined mask pattern is drawn directly on the surface of a resin composition for optical lithography, and the mask pattern is irradiated with light, thereby irradiating the surface of the resin composition containing a photocurable component through the mask pattern The step of forming a cured resin layer corresponding to the drawing is repeated to form a three-dimensional article composed of multiple cured resin layers. Thus, unlike the beam scanning, the curing is uniform in cross section.