logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6780498 B1

PDFFull Text
Date of Patent:
Aug. 24, 2004

Filed:

Oct. 26, 2001

Silicon-based composition, low dielectric constant film, semiconductor device, and method for producing low dielectric constant film

Applicant:
Inventors:

Yoshihiro Nakata, Kawasaki, JP;

Katsumi Suzuki, Kawasaki, JP;

Iwao Sugiura, Kawasaki, JP;

Ei Yano, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:

Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

Primary Examiner:

Terrel Morris

Assistant Examiner:

Hai Vo

Int. Cl.
CPC ...
B32B 3/26 ; C08L 8/304 ;
U.S. Cl.
CPC ...
B32B 3/26 ; C08L 8/304 ;
Abstract

A composition comprising a siloxane resin, a silicon compound substantially consisting of silicon, carbon and hydrogen, wherein the number ratio of carbon to silicon atoms forming an —X— bond (wherein X is (C) (where m is an integer in the range of from 1 to 3), or a substituted or unsubstituted aromatic group with 9 or less carbon atoms) in the main chain of one molecule is in the range of from 2:1 to 12:1, and a solvent, is subjected to a heat treatment to form a low dielectric constant film. Accordingly, a low dielectric constant film having excellent resistance against chemicals and excellent moisture resistance is provided. A semiconductor integrated circuit having a fast response can be produced by using the film.

Find Patent Forward Citations

Nakata, Yoshihiro. (2004). Silicon-based composition, low dielectric constant film, semiconductor device, and method for producing low dielectric constant film (U.S. Patent No. 6780498). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6780498

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…