The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Jan. 03, 2001
Applicant:
Inventors:
Mark J. Purdy, Akron, OH (US);
James W. Rudolph, Colorado Springs, CO (US);
Lowell D. Bok, Anna, OH (US);
Assignee:
Goodrich Corporation, Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
The invention relates to pressure gradient processes for forcing infiltration of a reactant gas into a porous structure. The process comprises the steps of partially densifying a porous structure with a pressure gradient CVI/CVD process in which a first potion of the porous structure is subjected to greater pressure than a second portion of the porous structure. The process is suited for the simultaneous CVI/CVD processing of large quantities of aircraft brake.