The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Feb. 03, 2003
Applicant:
Inventors:
Masahiro Ikadai, Osaka, JP;
Etsuo Ogino, Osaka, JP;
Assignee:
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/434 ; C23C 1/600 ;
Abstract
The prevent invention improves the film thickness distribution in the direction of revolution of substrates by a simple manner in a method for forming coating films, wherein a evaporating source is disposed at a predetermined distance from substrates and when a coating film material is applied from the evaporating source onto the substrate surfaces while revolving the substrates coating films are formed on the substrate surfaces in a condition where the radius of curvature of the substrates obtained by bending the substrates within the elasticity range is made equal to the radius of revolution of the substrates