The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2004

Filed:

Mar. 22, 2001
Applicant:
Inventors:

Osamu Sakai, Nara-ken, JP;

Satoshi Okamoto, Mie-ken, JP;

Toshio Akai, Kyoto-fu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
Abstract

A plasma deposition device comprises electrodes mounted on an electrode substrate , gas introducing holes provided between said electrodes for introducing material gas G to the interior, a deposition substrate provided to oppose to said electrodes from a predetermined distance d, and a power source generating plasma from said material gas by providing energy thereto, wherein material gas G is resolved to active species R deposited on said deposition substrate , characterized in applying voltage to adjacent electrodes so as to generate discharge DC.


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