The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2004
Filed:
Apr. 17, 2002
Applicant:
Inventors:
Iqbal Shareef, Fremont, CA (US);
Erez Shmuel, San Jose, CA (US);
Syed Basha, Pleasanton, CA (US);
Suwipin Martono, Fremont, CA (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 1/900 ;
U.S. Cl.
CPC ...
F26B 1/900 ;
Abstract
A processing chamber top is provided. The chamber top includes a top surface and a bottom surface having an inner and an outer edge. The bottom surface is sloped downward from the inner edge to the outer edge. A central opening extends through the chamber top. In one embodiment, the downward slope is between about 10 degrees and about 20 degrees. A method for processing a wafer in a processing chamber and a method for uniformly heating a substrate in a processing chamber are also provided.