The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2004
Filed:
May. 18, 2001
Applicant:
Inventors:
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 3/56 ; C25D 5/18 ;
U.S. Cl.
CPC ...
C25D 3/56 ; C25D 5/18 ;
Abstract
A method for forming a plated magnetic thin film of high saturation magnetization and low coercivity having the general form Co Fe M , where M can be Mo, Cr, W, Ni or Rh, which is suitable for use in magnetic recording heads that write on narrow trackwidth, high coercivity media. The plating method includes four current application processes: direct current, pulsed current, pulse reversed current and conditioned pulse reversed current.
Quick Actions:
Chen, Chaopeng. (2004). Method of manufacturing an ultra high saturation moment soft magnetic thin film (U.S. Patent No. 6776891). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6776891
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile