The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Apr. 17, 2002
Hanyang Hak Won Co., Ltd., Seoul, KR;
Abstract
An apparatus and method for providing an input signal having a desired pulse width and amplitude to atomic force miscoscopes (AFMs) for use in nano-lithography are provided. An input signal providing apparatus for a contact type AFM includes: a pulse width adjusting unit which adjusts the width of a positive pulse of an input square wave to a predetermined pulse width; and an amplitude adjusting unit which adjusts the amplitude of the positive pulse of the square wave to a predetermined voltage. An input signal providing method for the contact type AFM uses the apparatus having this structure. An input signal providing apparatus for a non-contact type AFM further includes a square pulse generating unit which generates a square pulse having a predetermined phase in synchronization with an input resonance signal, and an input signal providing method for the non-contact type AFM further involves generating the square pulse having a predetermined phase in synchronization with the input resonance signal. As a result, more precise nano-lithography can be achieved using an AFM to which the apparatus and method described above are applied.