The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Jul. 20, 2001
Nobuo Kawada, Annaka, JP;
Toshio Ohba, Annaka, JP;
Shin-Etsu Chemical Co., LTD, Chiyoda-ku, JP;
Abstract
An electron beam system for treating filamentary workpieces includes an electron beam irradiation chamber having openings through which passes a filamentary workpiece, an electron beam generator including means for generating, accelerating and focusing electrons, and a communicating section which connects the electron beam generator with the electron beam irradiation chamber. The system also has a differential evacuating means for holding the pressure within the electron beam generator below that within the electron beam irradiation chamber. Electrons are generated, accelerated, and focused by the electron beam generator into a beam which passes from the generator through the communicating section to the electron beam irradiation chamber where the beam is directed at a filamentary workpiece. The system is able to uniformly, efficiently, and continuously apply electron beam irradiation to a traveling filamentary workpiece. When used in the fabrication of optical fiber, this system can accommodate higher fiber drawing speeds without compromising the transmission characteristics of the resulting optical fiber.