The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
May. 23, 2000
Teiichirou Chiba, Hiratsuka, JP;
Ryuusuke Komura, Hiratsuka, JP;
Komatsu Limited, Tokyo, JP;
Abstract
A dot mark forming method for obtaining a dot mark includes a liquid crystal mask in which the maximum length of each pixel is 50 to 2,000 &mgr;m and is irradiated with a homogenized laser beam. The energy density of a split laser beam passed through the liquid crystal mask is set to 1.0 to 15.0 J/cm and is condensed after the mask by a lens unit so that the maximum length of each dot becomes 1 to 15 &mgr;m. A single dot mask is formed on each laser irradiated point. The dot mark has a protrusion in the center which protrudes upward from the surface of the article to be marked. The length along the surface of the article is 1 to 15 &mgr;m and the height of the protrusion is 0.01 to 5 &mgr;m.