The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Dec. 02, 2001
Hideo Asano, Osaka, JP;
Kenichi Ueda, Suita, JP;
Minoru Yamaguchi, Ibaraki, JP;
Masatoshi Yoshida, Nara, JP;
Tomomasa Kaneko, Kyoto, JP;
Shingo Kataoka, Ibaraki, JP;
Nippon Shokubai Co., Ltd., Osaka, JP;
Abstract
The present invention provides: a photosensitive resin composition, which can form uniform coating films having higher coating film strength without causing surface contamination, decrease of evenness of coating films, decrease of film thickness, and coloring by decomposition in heat treatment of subsequent steps, and has good sensitivity of exposure. The photosensitive resin composition comprises a lactone-ring-containing polymer (A) as an essential component, wherein: the lactone-ring-containing polymer (A) is obtained by carrying out polymerization of comonomers and lactonization at the same time wherein the comonomers include a 2-(hydroxyalkyl)acrylate ester and an acidic-group-containing monomer; and the lactone-ring-containing polymer (A) is obtained by almost quantitatively carrying out lactonization of a 2-(hydroxyalkyl)acrylate ester structural unit.