The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
May. 08, 2002
Applicant:
Inventors:
Assignee:
Industrial Technology Research Institute, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 ;
U.S. Cl.
CPC ...
G03C 5/00 ;
Abstract
A process of manufacturing a diffusive direct reflector by Gray tone exposure. The process uses a controllable transmittance photomask on which the photomask pattern is formed by Gray tone exposure, the photomask pattern vertically divided into a plurality of regions, each having a plurality of micro transparent blocks and a plurality of micro dark blocks, so that a ratio of the plurality of micro transparent blocks's area to the total area of respective region has a feature of gradual change, so as to form a transmittance profile for controlling the transmittance profile and producing a desired structure on the diffusive direct reflector.