The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Apr. 25, 2003
Applicant:
Inventors:
Hiroshi Funakubo, Kawasaki, JP;
Yasushi Murakami, Nagano-ken, JP;
Hideaki Machida, Uenobara-machi, JP;
Assignee:
Tri Chemical Laboratory Inc., Yamanashi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
A process for chemical vapor deposition includes depositing a film using a metal &bgr;-diketonate complex and an &agr;, &bgr;-unsaturated alcohol. The metal &bgr;-diketonate complex and the &agr;, &bgr;-unsaturated alcohol is contacted on the substrate at the same time, at different times or alternately.
Funakubo, Hiroshi. (2004). Chemical vapor deposition method and related material (U.S. Patent No. 6773750). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6773750
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile