The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Jan. 31, 2001
Applicant:
Inventor:
John R. Leitz, Victoria, AU;
Assignee:
Showa Shinku Co., Ltd., Sagamihara, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/432 ;
U.S. Cl.
CPC ...
C23C 1/432 ;
Abstract
System for frequency adjustment of piezoelectric resonators by ion etching in vacuum, based on arranging the resonators in rows and columns on a tray that can be moved to simultaneously expose two rows of resonators to the two straight-track portions of an ion gun having a race-track-shaped beam pattern whose straight tracks are spaced at an integer multiple of the inter-row spacing d. As the tray is moved in steps of d, two rows can be etched simultaneously, and each row can be sequentially exposed to a “pre-etch” and “final-etch” stage, with time between the two stages for the resonators to cool down after the “pre-etch” stage.