The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2004

Filed:

Dec. 03, 2001
Applicant:
Inventor:

Ichirou Miyagawa, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 1/514 ; B41J 2/700 ;
U.S. Cl.
CPC ...
B41J 1/514 ; B41J 2/700 ;
Abstract

The present invention relates to a multibeam exposure head having a multibeam light source which exposes a recording material by main scanning. Herein, the multibeam light source has a first multiple beam forming light source in which a plurality of beam emitting ports are arranged parallel to each other while being spaced apart from each other by a predetermined distance, and a second multiple beam forming light source in which a plurality of beam emitting ports are arranged parallel to each other being spaced apart from each other by the predetermined distance.


Find Patent Forward Citations

Miyagawa, Ichirou. (2004). Multibeam exposure head and multibeam exposure apparatus (U.S. Patent No. 6771299). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6771299

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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