The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2004

Filed:

Sep. 10, 2002
Applicant:
Inventors:

Cornelius Christian Russ, Princeton, NJ (US);

John Armer, Middlesex, NJ (US);

Markus Paul Josef Mergens, Plainsboro, NJ (US);

Phillip Czeslaw Jozwiak, Plainsboro, NJ (US);

Assignee:

Sarnoff Corporation, Princeton, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/972 ; H01L 2/362 ;
U.S. Cl.
CPC ...
H01L 2/972 ; H01L 2/362 ;
Abstract

An electrostatic discharge (ESD) protection device having a silicon controlled rectifier (SCR) for protecting circuitry of an integrated circuit (IC). The SCR includes a N-doped layer disposed over a substrate and a first P doped region disposed over the N-doped layer. At least one first N+ doped region forming a cathode is disposed over the P-doped region and coupled to ground. The at least one first N+ doped region, first P-doped region, and N-doped layer form a vertical NPN transistor of the SCR. A second P doped region forming an anode is coupled to a protected pad. The second P doped region is disposed over the N-doped layer, and is laterally positioned and electrically isolated with respect to the first P doped region. The second P doped region, N-doped layer, and first P doped region form a lateral PNP transistor of the SCR.


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