The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2004
Filed:
Feb. 24, 2003
Koji Iwasawa, Kyoto, JP;
Nissin Electric Co., Ltd., Kyoto, JP;
Abstract
The ion implantation apparatus deals with an ion beam as a charged particle beam and has an accelerating tube incorporating an electrostatic lens for converging/diverging it. The control of the electrostatic lens is carried out as follows. The swept ion beam is received by a single Faraday cup to measure the beam quantity I(n) and the beam width WD(p) of the ion beam . The evaluated values of the beam quantity and beam width with respect to prescribed standards are calculated. These evaluated values are assigned weights to calculate a unified evaluated value. The focusing voltage Vf applied to the electrostatic lens with the accelerating tube is controlled so that the unified evaluated value is increased. A waveform shaping controller and beam controller constitute a device for making such control.