The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2004

Filed:

Jul. 03, 2000
Applicant:
Inventors:

William Patrick Flanagan, Rexford, NY (US);

Roger Neal Johnson, Hagaman, NY (US);

William Guy Morris, Rexford, NY (US);

Assignee:

General Electric, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 3/110 ; G01N 3/500 ; G01N 1/506 ; G01N 3/300 ; G01N 3/348 ;
U.S. Cl.
CPC ...
G01N 3/110 ; G01N 3/500 ; G01N 1/506 ; G01N 3/300 ; G01N 3/348 ;
Abstract

In one exemplary embodiment, the present invention is directed to a method that comprises providing a reaction substrate having a plurality of substrate reservoirs adapted to receive a reactant system at least partially embodied in a liquid. A thermal unit maintains the reactant system at a first temperature. A head plate is disposed adjacent to the reaction substrate to form a sealed and pressurized headspace above the substrate reservoirs. The head plate is maintained at a second temperature higher than the first temperature. A second reactant may be introduced as a gas into the headspace above the plurality of substrate reservoirs.


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