The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2004
Filed:
Apr. 15, 2003
Applicant:
Inventors:
Michael D. Brady, Painted Post, NY (US);
Céline C. Guermeur, Chartrettes, FR;
Yann P. M. Nédeléc, Avon, FR;
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/160 ;
U.S. Cl.
CPC ...
G03B 2/160 ;
Abstract
Self-aligned aperture masks are produced using a positive-acting photoresist ( ) which is developed with a liquid developer. The apertures ( ) of the mask have lower levels of inter-aperture variability than masks produced using mechanical transfer of toner particles (FIGS. and ), both for the apertures of a given mask and between masks.