The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2004

Filed:

Jan. 12, 1999
Applicant:
Inventors:

Hiroshi Ito, San Jose, CA (US);

Ashish Pandya, Natick, MA (US);

Roger F. Sinta, Woburn, MA (US);

Assignee:

Shipley Company, L.L.C., Marlborough, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ;
U.S. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ;
Abstract

The present invention relates to new copolymers and use of such copolymer as a resin binder component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention include repeat units of 1) meta-hydroxystyrene groups, 2) para-hydroxystyrene groups, and 3) photoacid-labile groups.


Find Patent Forward Citations

Ito, Hiroshi. (2004). Hydroxyphenyl copolymers and photoresists comprising same (U.S. Patent No. 6770413). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6770413

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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